Dependence of electron cyclotron resonance plasma characteristicson magnetic field profiles

Seiji Samukawa, Tsuyoshi Nakamura

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Ion energy distribution is influenced by the magnetic held profiles in electron cyclotron resonance (ECR) plasma. When a 875 G equi-magnetic held is nonuniform, the microwave absorption concentrates at the ECR position which is located near the microwave window. Then, the mean ion energy distribution on the substrate holder becomes much broader due to the ion acceleration by the plasma potential difference. In addition, the ion energy distribution depends on the uniformity of the magnetic held gradient at the ECR position. The microwave is absorbed efficiently around the small gradient ECR position. Therefore, a uniform magnetic held gradient at the ECR position causes a uniform and sharp ion energy distribution.

Original languageEnglish
Pages (from-to)1330-1332
Number of pages3
JournalJapanese journal of applied physics
Volume30
Issue number7
DOIs
Publication statusPublished - 1991 Jul
Externally publishedYes

Keywords

  • ECR plasma etching
  • ECR position
  • Ion energy
  • Magnetic field gradient
  • Magnetic field profile

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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