Dependence of electron cyclotron resonance plasma characteristics on magnetic field profiles

Seiji Samukawa, Tsuyoshi Nakamura

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Electron cyclotron resonance (ECR) plasma generation is influenced by the magnetic field profiles in ECR plasma. When an 875 G equimagnetic field and magnetic field gradient are nonuniform, the nonuniform plasma is generated around the ECR position (875 G position). Uneven plasma discharge causes ion acceleration and disturbs the ion flight directions due to the potential differences in ECR plasma. Therefore, a uniform magnetic field gradient at the ECR position and the flat 875 G equimagnetic field profile are necessary to achieve a precise pattern transfer without microloading effects.

Original languageEnglish
Pages (from-to)3147-3153
Number of pages7
JournalJapanese journal of applied physics
Volume30
Issue number11S
DOIs
Publication statusPublished - 1991 Nov
Externally publishedYes

Keywords

  • ECR plasma etching
  • ECR position
  • Ion energy
  • Magnetic field gradient
  • Magnetic field profile

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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