Abstract
Electron cyclotron resonance (ECR) plasma generation is influenced by the magnetic field profiles in ECR plasma. When an 875 G equimagnetic field and magnetic field gradient are nonuniform, the nonuniform plasma is generated around the ECR position (875 G position). Uneven plasma discharge causes ion acceleration and disturbs the ion flight directions due to the potential differences in ECR plasma. Therefore, a uniform magnetic field gradient at the ECR position and the flat 875 G equimagnetic field profile are necessary to achieve a precise pattern transfer without microloading effects.
| Original language | English |
|---|---|
| Pages (from-to) | 3147-3153 |
| Number of pages | 7 |
| Journal | Japanese journal of applied physics |
| Volume | 30 |
| Issue number | 11S |
| DOIs | |
| Publication status | Published - 1991 Nov |
| Externally published | Yes |
Keywords
- ECR plasma etching
- ECR position
- Ion energy
- Magnetic field gradient
- Magnetic field profile
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)