Dental application of TiO2 films prepared by laser CVD

Ai Momozawa, Hirokazu Katsui, Akihiko Ito, Takashi Goto

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

TiO2 is widely used in dental materials as orthopedic and dental implant thanks to its good properties and biocompatibility. Rutile- and anatase-type TiO2 films were prepared by laser chemical vapor deposition using Nd: YAG laser. The TiO2 films showed cauliflower like microstructures at laser power of 160 W. The highest deposition rate was 17.1 μm/h at the total pressure of 800 Pa. Rutile- and anatase-type TiO2 was formed at the total pressure of 210 Pa, anatase-type at 800 Pa and rutile-type at 1500 Pa. The degree of osseointegration in the early stages is critical for determining the mechanical stability of the implant. The cell attachment behaviors of TiO2 films, in particular, the cell density and aspect ratio of osteoblast cells on TiO2 films were evaluated. Microstructure of the surface and photocatalytic performance of anatase-type TiO2 may be effective for cell attachment.

Original languageEnglish
Pages (from-to)128-131
Number of pages4
JournalFuntai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Volume63
Issue number3
DOIs
Publication statusPublished - 2016 Mar

Keywords

  • Cell attachment
  • Coating
  • Laser chemical vapor deposition (LCVD)
  • Osseointegration
  • TiO film

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering
  • Metals and Alloys
  • Materials Chemistry

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