Densification of hBN with the as-coated SiO2 nanolayer by rotary chemical vapor deposition

Jianfeng Zhang, Xin Zhang, Gaiye Li, Yuping Wu, Takashi Goto

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

SiO2 nanolayer, less than 50 nm in thickness, was coated on hexagonal boron nitride (hBN) plate powders by rotary chemical vapor deposition (RCVD) to assist densification of sinter-hard hBN. In RCVD process, tetraethylorthosilicate (TEOS) precursor heated at 110°C was carried into a reactor by argon, and then reacted with oxygen to form SiO2 at 700°C, with by-products of CO2 or H2O gases vacuumed out the reactor. Full expose of the surface of hBN powders to TEOS, argon and oxygen gases by RCVD technique and stable proceeding of decomposition reaction of TEOS contributed to the uniform distribution of SiO2 nanolayer. Viscous or liquid flow of uniform SiO2 nanolayer sintering aids assisted densification process of hBN and elevated its relative density to a maximum value of 96.2% at 1900°C.

Original languageEnglish
Pages (from-to)423-427
Number of pages5
JournalJournal of the Ceramic Society of Japan
Volume123
Issue number1437
DOIs
Publication statusPublished - 2015

Keywords

  • Hexagonal boron nitride (hbn)
  • Rotary chemical vapor deposition
  • SiO nanolayer
  • Spark plasma sintering

ASJC Scopus subject areas

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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