Deformation of varifocal mirror with narrow frame by SOI wafer residual stress

Takashi Sasaki; Kazuhiro Hane

doi:10.1541/ieejsmas.131.310

Deformation of varifocal mirror with narrow frame by SOI wafer residual stress

Takashi Sasaki, Kazuhiro Hane

ENG - Finemechanics

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Silicon-on-insulator (SOI) wafers are used for many micro-electro- mechanical systems (MEMS). The influences of residual stress of SOI wafer on the fabricated structures are important especially for micro-mirror because the optical performances are often affected by them. In this study, we propose an analytical calculation for the deformation of mirror and frame of a varifocal mirror. The deformations of the fabricated structures were measured using a white light interferometer. The frame was tilted at 2.8mrad which was explained by the calculated value of 3.9mrad. The mirror was deflected by 100nm with the top-flat shape, which also agreed well with the proposed analysis.

Original language	English
Pages (from-to)	310-315
Number of pages	6
Journal	IEEJ Transactions on Sensors and Micromachines
Volume	131
Issue number	8
DOIs	https://doi.org/10.1541/ieejsmas.131.310
Publication status	Published - 2011 Nov 1

Keywords

Mirror supporting frame
SOI wafer
Surface profile
Varifocal mirror

ASJC Scopus subject areas

Mechanical Engineering
Electrical and Electronic Engineering

Access to Document

10.1541/ieejsmas.131.310

Fingerprint Dive into the research topics of 'Deformation of varifocal mirror with narrow frame by SOI wafer residual stress'. Together they form a unique fingerprint.

Cite this

@article{bd82d026f8a54de9bb5f704ee6e61d19,

title = "Deformation of varifocal mirror with narrow frame by SOI wafer residual stress",

abstract = "Silicon-on-insulator (SOI) wafers are used for many micro-electro- mechanical systems (MEMS). The influences of residual stress of SOI wafer on the fabricated structures are important especially for micro-mirror because the optical performances are often affected by them. In this study, we propose an analytical calculation for the deformation of mirror and frame of a varifocal mirror. The deformations of the fabricated structures were measured using a white light interferometer. The frame was tilted at 2.8mrad which was explained by the calculated value of 3.9mrad. The mirror was deflected by 100nm with the top-flat shape, which also agreed well with the proposed analysis.",

keywords = "Mirror supporting frame, SOI wafer, Surface profile, Varifocal mirror",

author = "Takashi Sasaki and Kazuhiro Hane",

year = "2011",

month = nov,

day = "1",

doi = "10.1541/ieejsmas.131.310",

language = "English",

volume = "131",

pages = "310--315",

journal = "IEEJ Transactions on Sensors and Micromachines",

issn = "1341-8939",

publisher = "The Institute of Electrical Engineers of Japan",

number = "8",

}

TY - JOUR

T1 - Deformation of varifocal mirror with narrow frame by SOI wafer residual stress

AU - Sasaki, Takashi

AU - Hane, Kazuhiro

PY - 2011/11/1

Y1 - 2011/11/1

N2 - Silicon-on-insulator (SOI) wafers are used for many micro-electro- mechanical systems (MEMS). The influences of residual stress of SOI wafer on the fabricated structures are important especially for micro-mirror because the optical performances are often affected by them. In this study, we propose an analytical calculation for the deformation of mirror and frame of a varifocal mirror. The deformations of the fabricated structures were measured using a white light interferometer. The frame was tilted at 2.8mrad which was explained by the calculated value of 3.9mrad. The mirror was deflected by 100nm with the top-flat shape, which also agreed well with the proposed analysis.

AB - Silicon-on-insulator (SOI) wafers are used for many micro-electro- mechanical systems (MEMS). The influences of residual stress of SOI wafer on the fabricated structures are important especially for micro-mirror because the optical performances are often affected by them. In this study, we propose an analytical calculation for the deformation of mirror and frame of a varifocal mirror. The deformations of the fabricated structures were measured using a white light interferometer. The frame was tilted at 2.8mrad which was explained by the calculated value of 3.9mrad. The mirror was deflected by 100nm with the top-flat shape, which also agreed well with the proposed analysis.

KW - Mirror supporting frame

KW - SOI wafer

KW - Surface profile

KW - Varifocal mirror

UR - http://www.scopus.com/inward/record.url?scp=80054967611&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=80054967611&partnerID=8YFLogxK

U2 - 10.1541/ieejsmas.131.310

DO - 10.1541/ieejsmas.131.310

M3 - Article

AN - SCOPUS:80054967611

VL - 131

SP - 310

EP - 315

JO - IEEJ Transactions on Sensors and Micromachines

JF - IEEJ Transactions on Sensors and Micromachines

SN - 1341-8939

IS - 8

ER -

Deformation of varifocal mirror with narrow frame by SOI wafer residual stress

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Cite this