Abstract
Silicon-on-insulator (SOI) wafers are used for many micro-electro- mechanical systems (MEMS). The influences of residual stress of SOI wafer on the fabricated structures are important especially for micro-mirror because the optical performances are often affected by them. In this study, we propose an analytical calculation for the deformation of mirror and frame of a varifocal mirror. The deformations of the fabricated structures were measured using a white light interferometer. The frame was tilted at 2.8mrad which was explained by the calculated value of 3.9mrad. The mirror was deflected by 100nm with the top-flat shape, which also agreed well with the proposed analysis.
Original language | English |
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Pages (from-to) | 310-315 |
Number of pages | 6 |
Journal | IEEJ Transactions on Sensors and Micromachines |
Volume | 131 |
Issue number | 8 |
DOIs | |
Publication status | Published - 2011 Nov 1 |
Keywords
- Mirror supporting frame
- SOI wafer
- Surface profile
- Varifocal mirror
ASJC Scopus subject areas
- Mechanical Engineering
- Electrical and Electronic Engineering