We report the pressure dependence of electrical resistivity and de Haas-van Alphen effect in an antiferromagnet CeTl3. With increasing pressure the Néel temperature TN decreases monotonically and both ρ0 and A values of the resistivity ρ = ρ0 + AT2 in the Fermi liquid relation increase, reflecting the approach to the quantum critical point. The critical pressure Pc is estimated to be about 6 GPa. The cyclotron effective masses also increase with increasing pressure.
- De Haas-van Alphen effect
- Quantum critical point
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering