Abstract
The dc self-bias voltage of RF planar magnetron discharges of argon gas was clarified by performing particle-in-cell/Monte Carlo (PIC/MC) simulations. The self-bias increased with increasing magnetic field and became positive. This dependence of self-bias on the magnetic field agrees with the experimental result, the theoretical result, and the numerical result of fluid simulation on magnetically enhanced capacitively coupled plasma with a magnetic field parallel to the electrode surface. The plasma was confined between the magnetic poles for a narrow gap (≤ 30 mm), but spread over a large space for a larger gap.
Original language | English |
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Pages (from-to) | 517-521 |
Number of pages | 5 |
Journal | Thin Solid Films |
Volume | 506-507 |
DOIs | |
Publication status | Published - 2006 May 26 |
Keywords
- Dc self-bias voltage
- Particle-in-cell/Monte Carlo simulation
- Processing plasma
- Radio frequency magnetron discharges
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry