TY - GEN
T1 - Damage-less graphene etching by oxygen neutral beam for graphene nanoribbon fabrication
AU - Wada, Akira
AU - Igarashi, Koki
AU - Okada, Takeru
AU - Samukawa, Seiji
N1 - Copyright:
Copyright 2014 Elsevier B.V., All rights reserved.
PY - 2013
Y1 - 2013
N2 - Graphene etching using oxygen neutral beam for high-quality graphene nanoribbon fabrication was investigated. A convenient index of D-band to G-band Raman intensity ratio showed that fewer defects on the edge of the graphene after neutral beam etching were observed than after plasma etching. The results demonstrate that damage-less graphene etching is possible by neutral beam etching due to suppression of UV photon radiation.
AB - Graphene etching using oxygen neutral beam for high-quality graphene nanoribbon fabrication was investigated. A convenient index of D-band to G-band Raman intensity ratio showed that fewer defects on the edge of the graphene after neutral beam etching were observed than after plasma etching. The results demonstrate that damage-less graphene etching is possible by neutral beam etching due to suppression of UV photon radiation.
KW - Graphene
KW - defects
KW - neutral beam etching
UR - http://www.scopus.com/inward/record.url?scp=84894123240&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84894123240&partnerID=8YFLogxK
U2 - 10.1109/NANO.2013.6720888
DO - 10.1109/NANO.2013.6720888
M3 - Conference contribution
AN - SCOPUS:84894123240
SN - 9781479906758
T3 - Proceedings of the IEEE Conference on Nanotechnology
SP - 917
EP - 920
BT - 2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013
T2 - 2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013
Y2 - 5 August 2013 through 8 August 2013
ER -