Damage-free surface treatment of carbon nanotubes and self-assembled monolayer devices using a neutral beam process for fusing top-down and bottom-up processes

Seiji Samukawa, Yasushi Ishikawa, Keiji Okumura, Yoshinori Sato, Kazuyuki Tohji, Takao Ishida

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Plasma etching processes have been used for the past 30 years to shrink the pattern size of integrated devices. However, the inherent problems of plasma processes, such as ultraviolet photon radiation damage, limit the effectiveness of etching and surface treatments of nanoscale devices. To overcome these problems, we developed a neutral beam surface treatment process. The process uses neutral beams and a defect-free surface process to fabricate carbon nanotubes and self-assemble mono-layer devices. We found that neutral beams can be used to produce atomically defect-free surfaces in carbon nanotubes and organic molecules. This technique has potential for fabricating nanodevices.

Original languageEnglish
Article number024006
JournalJournal of Physics D: Applied Physics
Volume41
Issue number2
DOIs
Publication statusPublished - 2008 Jan 21

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

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