Cu-Cu Direct Bonding Through Highly Oriented Cu Grains for 3D-LSI Applications

M. Murugesan, E. Sone, A. Simomura, M. Motoyoshi, M. Sawa, K. Fukuda, Mitsumasa Koyanagi, T. Fukushima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

The effect of an extremely large and relatively ordered Cu grains the yield of Cu-Cu direct bonding was investigated. Our modified electroplating process followed by post processing has resulted into the formation of 10-15 μm large Cu grains before Cu-Cu direct bonding. The microstructural evaluation showed formation relatively (100) oriented Cu-grains. The less hard and strain-suppressed Cu-grains as inferred from respectively, Vickers hardness and tensile test highly facilitates the Cu diffusion across the oriented grains during the Cu-Cu direct/hybrid bonding.

Original languageEnglish
Title of host publicationIEEE International 3D System Integration Conference, 3DIC 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781665417068
DOIs
Publication statusPublished - 2021
Event2021 IEEE International 3D System Integration Conference, 3DIC 2021 - Virtual, Raleigh, United States
Duration: 2021 Nov 152021 Nov 18

Publication series

NameIEEE International 3D System Integration Conference, 3DIC 2021

Conference

Conference2021 IEEE International 3D System Integration Conference, 3DIC 2021
Country/TerritoryUnited States
CityVirtual, Raleigh
Period21/11/1521/11/18

Keywords

  • (100) oriented Cu-grain
  • Cu-Cu direct bonding

ASJC Scopus subject areas

  • Fluid Flow and Transfer Processes
  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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