Crystalographic Orientation of Continuously Sputtered Co-Cr Films

H. Ito, Y. Tanaka, R. Nishikawa, T. Suzuki

Research output: Contribution to journalArticle

Abstract

The dependence of film crystal orientation on film thickness for several Co-Cr films formed by dc planar magnetron sputtering with a variety of deposition mask arrangements was investigated. Special attention was paid to the initial layer. The dependence of magnetic properties on film thickness was found to be strongly influenced by the mask arrangement, especially by the distance between the mask edge and the roll, and by the initial incidence angle for the sputtered atoms. It was found that controlling these parameters properly is extremely important in continuous sputtering.

Original languageEnglish
Pages (from-to)944-946
Number of pages3
JournalIEEE Translation Journal on Magnetics in Japan
Volume1
Issue number8
DOIs
Publication statusPublished - 1985 Nov
Externally publishedYes

ASJC Scopus subject areas

  • Engineering (miscellaneous)
  • Engineering(all)

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