Crystallographic orientation dependence of compositional transition and valence band offset at SiO2/Si interface formed using oxygen radicals

T. Suwa, Akinobu Teramoto, Y. Kumagai, K. Abe, X. Li, Y. Nakao, M. Yamamoto, Y. Kato, T. Muro, T. Kinoshita, T. Ohmi, Takeo Hattori

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

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Chemistry