Crystallization behavior of co-sputtered amorphous Ti-C and Co-C thin films

Toyohiko J. Konno, Koichi Bandoh

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

We have prepared Ti1-xCx (x=0.5-0.9) thin films by co-sputtering, and investigated their crystallization behavior by in-situ transmission electron microscopy. Only Ti0.1C0.9 exhibited a single phase amorphous state; while films with other compositions were found to be a mixture of the fee TiC phase and a carbon-based amorphous phase. Annealing of the Ti0.1C0.9 film at 400°C brought about the precipitation of the TiC particles of 30-40 nm within the amorphous carbon matrix. Upon further annealing at 500°C, these particles were found to grow abnormally, exhibiting rod-like morphology of about μm in length with [110] preferred orientation. The activation energy for growth was about 4.0eV. These findings were compared with the behavior of Co-C films; similarities were discussed from thermodynamical and kinetic points of view.

Original languageEnglish
Pages (from-to)57-60
Number of pages4
JournalJournal of Metastable and Nanocrystalline Materials
Volume24-25
DOIs
Publication statusPublished - 2005 Dec 1
Externally publishedYes

Keywords

  • Amorphous alloy
  • Crystallization
  • Metal carbides
  • Transmission electron microscopy

ASJC Scopus subject areas

  • Materials Science (miscellaneous)
  • Materials Science(all)
  • Condensed Matter Physics
  • Physical and Theoretical Chemistry

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