CRYSTALLINITY-INDUCED ACCELERATION OF INTERGRANULAR CRACKING IN THIN-FILM INTERCONNECTIONS UNDER HIGH CURRENT DENSITY

Shota Akasaki, Hideo Miura

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The degradation process of the crystallinity of grain boundaries in thin-film interconnections was visualized by applying EBSD analysis under high current density. The grain boundary diffusion was accelerated by electromigration only along random grain boundaries with low crystallinity. The crystallinity (IQ value obtained from EBSD analysis) of grain boundaries varied drastically depending on manufacturing process such as temperature, gas pressure, substrate material, and so on. The effective activation energy of self-diffusion of component element was dominated by the crystallinity of random grain boundaries. The measured value obtained from the low-crystallinity interconnections was much lower than that obtained from the thermodynamically stable bulk material, and therefore, the lifetime of intergranular cracking decreased to one hundredth in the worst case.

Original languageEnglish
Title of host publicationMechanics of Solids, Structures, and Fluids; Micro- and Nano- Systems Engineering and Packaging
PublisherAmerican Society of Mechanical Engineers (ASME)
ISBN (Electronic)9780791885680
DOIs
Publication statusPublished - 2021
EventASME 2021 International Mechanical Engineering Congress and Exposition, IMECE 2021 - Virtual, Online
Duration: 2021 Nov 12021 Nov 5

Publication series

NameASME International Mechanical Engineering Congress and Exposition, Proceedings (IMECE)
Volume12

Conference

ConferenceASME 2021 International Mechanical Engineering Congress and Exposition, IMECE 2021
CityVirtual, Online
Period21/11/121/11/5

ASJC Scopus subject areas

  • Mechanical Engineering

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