Crystal structure and magnetoresistance of fe10ni90 films deposited by sputter-beam method

Yukimasa Yokoyama, Satoshi Okamoto, Osamu Kitakami, Yutaka Shimada, Fuminori Watanabe, Shinji Kondo, Atsushi Hayashi, Hiroyuki Fujita

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Films of Fe10Ni90 alloy were deposited by the sputter-beam method and their magnetic properties were compared with those of films deposited by a conventional RF sputtering method. High magnetoresistance was obtained for film thickness between 550∼2250 Å. Some of the films exhibit magnetoresistance equal to the bulk value. These properties are attributed to a more enhanced crystal growth than in the RF method.

Original languageEnglish
Pages (from-to)L1222-L1224
JournalJapanese journal of applied physics
Volume32
Issue number9
DOIs
Publication statusPublished - 1993 Sep

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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    Yokoyama, Y., Okamoto, S., Kitakami, O., Shimada, Y., Watanabe, F., Kondo, S., Hayashi, A., & Fujita, H. (1993). Crystal structure and magnetoresistance of fe10ni90 films deposited by sputter-beam method. Japanese journal of applied physics, 32(9), L1222-L1224. https://doi.org/10.1143/JJAP.32.L1222