Crystal structure and dielectric/ferroelectric properties of CSD-derived HfO2-ZrO2 solid solution films

Chihoko Abe, Shuhei Nakayama, Marina Shiokawa, Hiroaki Kawashima, Kiliha Katayama, Takahisa Shiraishi, Takao Shimizu, Hiroshi Funakubo, Hiroshi Uchida

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)


Ultrathin films of HfO2-ZrO2 system, HfxZr1-xO2, were fabricated for generating ferroelectric phase. Polycrystalline HfxZr1-xO2 films were prepared via chemical solution deposition process, in which precursor films consisting of amorphous phase on platinized silicon wafer were crystallized by post-annealing. Metastable orthorhombic phase, recognized as the “ferroelectric” phase, appeared in the HfxZr1-xO2 films with chemical composition of x = 0.40–0.70 and with film thickness of approximately 40 nm, together with stable monoclinic and/or cubic phases. The dielectric permittivity, εr, and remanent polarization, Pr, varied with the chemical composition, meaning that constituent phases of the resulting HfxZr1-xO2 films dominate their dielectric and ferroelectric properties. Saturated P–E hysteresis loop with Pr of 2.1 μC/cm2 and coercive field of 580 kV/cm was confirmed for the solid solution film of Hf0.70Zr0.30O2 (x = 0.70) at 80 K, whereas no spontaneous polarization was confirmed for pure HfO2 film (x = 1.00). These results imply that the orthorhombic phase stabilized by Zr substitution would contribute to the generation of ferroelectricity in HfO2-based material consequently.

Original languageEnglish
Pages (from-to)S501-S505
JournalCeramics International
Publication statusPublished - 2017 Aug
Externally publishedYes


  • Ferroelectric properties
  • Films
  • HfO
  • ZrO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry


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