Crystal phase-selective epitaxy of rutile and anatase Nb-doped TiO 2 films on a GaN template by the helicon-wave-excited-plasma sputtering epitaxy method

Kouji Hazu, Aly Fouda, Tokuyuki Nakayama, Akikazu Tanaka, Shigefusa F. Chichibu

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12 Citations (Scopus)

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