Crystal-face dependences of surface band edges and hole reactivity, revealed by preparation of essentially atomically smooth and stable (110) and (100) n-TiO2 (rutile) surfaces

Ryuhei Nakamura, Naomichi Ohashi, Akihito Imanishi, Takeo Osawa, Yuji Matsumoto, Hideomi Koinuma, Yoshihiro Nakato

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98 Citations (Scopus)

Abstract

Essentially atomically smooth (100) and (110) n-TiO2 (rutile) surfaces were prepared by immersion of commercially available single-crystal wafers in 20% HF, followed by annealing at 600°C in air. The obtained surfaces were stable in aqueous solutions of pH 1 - 13, showing no change in the surface morphology on an atomic level, contrary to atomically flat surfaces prepared by ion sputtering and annealing under UHV. The success in preparation of the atomically smooth and stable n-TiO2 surfaces enabled us to reveal clear crystalface dependences of the surface band edges and hole reactivity in aqueous solutions.

Original languageEnglish
Pages (from-to)1648-1651
Number of pages4
JournalJournal of Physical Chemistry B
Volume109
Issue number5
DOIs
Publication statusPublished - 2005 Feb 10
Externally publishedYes

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry

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