Angular dependence of Hex and Hc, and the critical angle behavior are measured in CoFe/MnIr bilayers annealed at 200°C and 340°C. The interfacial exchange coupling anisotropy and the antiferromagnet anisotropy at tAF < tAFc are estimated from the best fitting of angular dependence of Hex and Hc using Stoner-Wohlfarth (S-W) model. These results confirm existence of interfacial exchange coupling anisotropy between F and AF layers for tAF < tAFc. The measured critical angles for tAF > tAFc as well as for tAF < t AFc are well explained using S-W model.
- Critical AF thickness
- Critical angle
- Exchange bias and coercivity
- Stoner-Wohlfarth model
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering