Critical angle behavior of exchange bias and coercivity in CoFe/MnIr bilayers

Dong Young Kim, Cheolgi Kim, Chong Oh Kim, M. Naka, M. Tsunoda, M. Takahashi

Research output: Contribution to journalArticlepeer-review

Abstract

Angular dependence of Hex and Hc, and the critical angle behavior are measured in CoFe/MnIr bilayers annealed at 200°C and 340°C. The interfacial exchange coupling anisotropy and the antiferromagnet anisotropy at tAF < tAFc are estimated from the best fitting of angular dependence of Hex and Hc using Stoner-Wohlfarth (S-W) model. These results confirm existence of interfacial exchange coupling anisotropy between F and AF layers for tAF < tAFc. The measured critical angles for tAF > tAFc as well as for tAF < t AFc are well explained using S-W model.

Original languageEnglish
Pages (from-to)3011-3013
Number of pages3
JournalIEEE Transactions on Magnetics
Volume42
Issue number10
DOIs
Publication statusPublished - 2006 Oct

Keywords

  • Critical AF thickness
  • Critical angle
  • Exchange bias and coercivity
  • Stoner-Wohlfarth model

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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