Coulomb blockade oscillations in patterned ultrathin graphite films

Shunsuke Odaka; Hisao Miyazaki; Takuya Moriki; Takashi Sato; Akinobu Kanda; Kazuhito Tsukagoshi; Yoichi Ootuka; Yoshinobu Aoyagl

doi:10.1143/JJAP.47.697

Coulomb blockade oscillations in patterned ultrathin graphite films

Shunsuke Odaka, Hisao Miyazaki, Takuya Moriki, Takashi Sato, Akinobu Kanda, Kazuhito Tsukagoshi, Yoichi Ootuka, Yoshinobu Aoyagl

Research output: Contribution to journal › Article › peer-review

Abstract

Nanoscale channel formation and characterization in ultrathin graphite film are performed. Two narrow channels with a submicron square connected in series are patterned by electron-beam lithography followed by oxygen plasma etching. The patterned film showed Coulomb blockade oscillations in the source-drain current upon a gate voltage change at 4.2 K. The Coulomb blockade effect occurred due to the electric potential modulation in the narrow graphite channels.

Original language	English
Pages (from-to)	697-699
Number of pages	3
Journal	Japanese journal of applied physics
Volume	47
Issue number	1 PART 2
DOIs	https://doi.org/10.1143/JJAP.47.697
Publication status	Published - 2008 Jan 22
Externally published	Yes

Keywords

Coulomb blockade
Microfabrication
Ultrathin graphite

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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keywords = "Coulomb blockade, Microfabrication, Ultrathin graphite",

author = "Shunsuke Odaka and Hisao Miyazaki and Takuya Moriki and Takashi Sato and Akinobu Kanda and Kazuhito Tsukagoshi and Yoichi Ootuka and Yoshinobu Aoyagl",

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T1 - Coulomb blockade oscillations in patterned ultrathin graphite films

AU - Odaka, Shunsuke

AU - Miyazaki, Hisao

AU - Moriki, Takuya

AU - Sato, Takashi

AU - Kanda, Akinobu

AU - Tsukagoshi, Kazuhito

AU - Ootuka, Yoichi

AU - Aoyagl, Yoshinobu

PY - 2008/1/22

Y1 - 2008/1/22

N2 - Nanoscale channel formation and characterization in ultrathin graphite film are performed. Two narrow channels with a submicron square connected in series are patterned by electron-beam lithography followed by oxygen plasma etching. The patterned film showed Coulomb blockade oscillations in the source-drain current upon a gate voltage change at 4.2 K. The Coulomb blockade effect occurred due to the electric potential modulation in the narrow graphite channels.

AB - Nanoscale channel formation and characterization in ultrathin graphite film are performed. Two narrow channels with a submicron square connected in series are patterned by electron-beam lithography followed by oxygen plasma etching. The patterned film showed Coulomb blockade oscillations in the source-drain current upon a gate voltage change at 4.2 K. The Coulomb blockade effect occurred due to the electric potential modulation in the narrow graphite channels.

KW - Coulomb blockade

KW - Microfabrication

KW - Ultrathin graphite

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JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

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