Corrigendum to “Fabrication of L1 0 -FeNi phase by sputtering with rapid thermal annealing” (Journal of Alloys and Compounds (2018) 750 (164–170), (S0925838818308156), (10.1016/j.jallcom.2018.02.318))

Takayuki Tashiro, Masaki Mizuguchi, Takayuki Kojima, Tomoyuki Koganezawa, Masato Kotsugi, Takumi Ohtsuki, Kazuhisa Sato, Toyohiko Konno, Koki Takanashi

Research output: Contribution to journalComment/debatepeer-review


The authors regret that the printed version misses to cite a review paper which has been published. The correct and final version of figure captions and references is shown in this corrigendum. The authors would like to apologise for any inconvenience caused. Fig. 6. GI-XRD profiles for FeNi film (30 nm) on MgO(001) substrates annealed at 250–400 °C at heating rate of 50 °C/s for 20 hours. (a) Profiles in a narrow range around FeNi(001) and (200) peaks for samples. (b) Profiles in narrow range around FeNi(110) and (220) peaks for samples [38]. Fig. 7. Annealing-temperature dependence of S for FeNi films (30 nm) on MgO(001) substrates at a heating rate of 50 °C/s for 20 hours [38]. Fig. 10. Magnetization curves of FeNi films (5 and 30 nm) on MgO substrates annealed at 350 °C for 20 hours at heating rate of 50 °C/s. Magnetic field was applied in-plane (blue line and circles) and out-of-plane (red line and circles) to film plane. Insets show enlarged magnetization curve around 0 Oe [38]. [38] K. Takanashi, M. Mizuguchi, T. Kojima, T. Tashiro, J. Phys. D. 50 (2017) 483002.

Original languageEnglish
Number of pages1
JournalJournal of Alloys and Compounds
Publication statusPublished - 2019 May 15

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry


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