Controllability of dopant ion number in single ion implantation

Takahiro Shinada; Takashi Matsukawa; Lwao Ohdomari

doi:10.1109/IMNC.1998.730067

Controllability of dopant ion number in single ion implantation

Takahiro Shinada, Takashi Matsukawa, Lwao Ohdomari

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 1998
Subtitle of host publication	1998 International Microprocesses and Nanotechnology Conference
Editors	Hyung Joon Yoo, Shinji Okazaki, Jinho Ahn, Ohyun Kim, Masanori Komuro
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	253-254
Number of pages	2
ISBN (Electronic)	4930813832, 9784930813831
DOIs	https://doi.org/10.1109/IMNC.1998.730067
Publication status	Published - 1998
Externally published	Yes
Event	1998 International Microprocesses and Nanotechnology Conference, MNC 1998 - Kyoungju, Korea, Republic of Duration: 1998 Jul 13 → 1998 Jul 16

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference
Volume	1998-July

Other

Other	1998 International Microprocesses and Nanotechnology Conference, MNC 1998
Country/Territory	Korea, Republic of
City	Kyoungju
Period	98/7/13 → 98/7/16

ASJC Scopus subject areas

Materials Science(all)
Nuclear and High Energy Physics
Computer Science Applications

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10.1109/IMNC.1998.730067

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Shinada, T., Matsukawa, T., & Ohdomari, L. (1998). Controllability of dopant ion number in single ion implantation. In H. J. Yoo, S. Okazaki, J. Ahn, O. Kim, & M. Komuro (Eds.), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference (pp. 253-254). [730067] (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.1998.730067

Controllability of dopant ion number in single ion implantation. / Shinada, Takahiro; Matsukawa, Takashi; Ohdomari, Lwao.

Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. ed. / Hyung Joon Yoo; Shinji Okazaki; Jinho Ahn; Ohyun Kim; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. p. 253-254 730067 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Shinada, T, Matsukawa, T & Ohdomari, L 1998, Controllability of dopant ion number in single ion implantation. in HJ Yoo, S Okazaki, J Ahn, O Kim & M Komuro (eds), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference., 730067, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference, vol. 1998-July, Institute of Electrical and Electronics Engineers Inc., pp. 253-254, 1998 International Microprocesses and Nanotechnology Conference, MNC 1998, Kyoungju, Korea, Republic of, 98/7/13. https://doi.org/10.1109/IMNC.1998.730067

Shinada T, Matsukawa T, Ohdomari L. Controllability of dopant ion number in single ion implantation. In Yoo HJ, Okazaki S, Ahn J, Kim O, Komuro M, editors, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. Institute of Electrical and Electronics Engineers Inc. 1998. p. 253-254. 730067. (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference). https://doi.org/10.1109/IMNC.1998.730067

Shinada, Takahiro ; Matsukawa, Takashi ; Ohdomari, Lwao. / Controllability of dopant ion number in single ion implantation. Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. editor / Hyung Joon Yoo ; Shinji Okazaki ; Jinho Ahn ; Ohyun Kim ; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. pp. 253-254 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference).

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author = "Takahiro Shinada and Takashi Matsukawa and Lwao Ohdomari",

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Controllability of dopant ion number in single ion implantation

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ASJC Scopus subject areas

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