Abstract
TiN(5 nm)[CoPt(4 nm)/TiN(x nm)]5 multilayer films (x = 1, 2, 4, 6, 8, 10, 14) have been deposited on glass substrates by dc magnetron sputtering, and a L10-CoPt structure with perpendicular magnetic anisotropy (PMA) has been obtained after annealing at 700 and 800°C. It is found that changing the TiN layer thickness and annealing temperature significantly affects the ordering degree and magnetic anisotropy energy of L10-CoPt/TiN multilayer films. To obtain the maximum value of the ordering degree and magnetic anisotropy energy, the optimum thickness of the TiN layer is around 4 and 8 nm, with an annealing temperature of 700 and 800°C, respectively. Structural characterization results have shown that the thickness of the TiN layer greatly affects the interface structure between CoPt and TiN layers. When TiN layer thickness is below 2 nm, it tends to be discontinuous after annealing, which results in the coalescence of the adjacent CoPt layers. When TiN layer thickness is above 8 nm, the interface roughness becomes larger. In such cases, the preferred orientation, ordering degree of the L10 structure and the PMA of the films will be impaired.
Original language | English |
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Article number | 155001 |
Journal | Journal of Physics D: Applied Physics |
Volume | 48 |
Issue number | 15 |
DOIs | |
Publication status | Published - 2015 Apr 22 |
Externally published | Yes |
Keywords
- L10 CoPt
- multilayer
- perpendicular magnetic anisotropy
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Acoustics and Ultrasonics
- Surfaces, Coatings and Films