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Control of tensile strain and interdiffusion in Ge/Si(001) epilayers grown by molecular-beam epitaxy
T. K.P. Luong, M. T. Dau, M. A. Zrir, M. Stoffel, V. Le Thanh, M. Petit, A. Ghrib, M. El Kurdi, P. Boucaud, H. Rinnert, J. Murota
Research output: Contribution to journal › Article › peer-review
50
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(Scopus)