Control of tensile strain and interdiffusion in Ge/Si(001) epilayers grown by molecular-beam epitaxy

T. K.P. Luong, M. T. Dau, M. A. Zrir, M. Stoffel, V. Le Thanh, M. Petit, A. Ghrib, M. El Kurdi, P. Boucaud, H. Rinnert, J. Murota

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