Control of sputtering in a modified magnetron-typed radio-frequency discharge

Yunlong Li, Satoru Iizuka, Noriyoshi Sato

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

In a modified magnetron-typed radio-frequency (RF) discharge plasma, the sheath potential in front of the RF electrode is controlled by varying the magnetic field configuration and strength around the RF electrode, which gives rise to a big change of particle sputtering from the RF electrode. The relation between the RF electrode potential and the plasma potential is quite different from that in the conventional capacitively coupled RF discharges, being responsible for a drastic decrease in the sputtering.

Original languageEnglish
Pages (from-to)585-588
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume132
Issue number4
DOIs
Publication statusPublished - 1997 Dec 1

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

Fingerprint Dive into the research topics of 'Control of sputtering in a modified magnetron-typed radio-frequency discharge'. Together they form a unique fingerprint.

Cite this