TY - JOUR
T1 - Control of sputtering in a modified magnetron-typed radio-frequency discharge
AU - Li, Yunlong
AU - Iizuka, Satoru
AU - Sato, Noriyoshi
N1 - Copyright:
Copyright 2017 Elsevier B.V., All rights reserved.
PY - 1997/12/1
Y1 - 1997/12/1
N2 - In a modified magnetron-typed radio-frequency (RF) discharge plasma, the sheath potential in front of the RF electrode is controlled by varying the magnetic field configuration and strength around the RF electrode, which gives rise to a big change of particle sputtering from the RF electrode. The relation between the RF electrode potential and the plasma potential is quite different from that in the conventional capacitively coupled RF discharges, being responsible for a drastic decrease in the sputtering.
AB - In a modified magnetron-typed radio-frequency (RF) discharge plasma, the sheath potential in front of the RF electrode is controlled by varying the magnetic field configuration and strength around the RF electrode, which gives rise to a big change of particle sputtering from the RF electrode. The relation between the RF electrode potential and the plasma potential is quite different from that in the conventional capacitively coupled RF discharges, being responsible for a drastic decrease in the sputtering.
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U2 - 10.1016/S0168-583X(97)00482-5
DO - 10.1016/S0168-583X(97)00482-5
M3 - Article
AN - SCOPUS:0031383189
VL - 132
SP - 585
EP - 588
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
SN - 0168-583X
IS - 4
ER -