Control of geometry in Si-based photonic nanostructures formed by maskless wet etching process and its impact on optical properties

Yusuke Hoshi, Takeshi Tayagaki, Takanori Kiguchi, Noritaka Usami

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

We demonstrate that maskless wet etching of self-assembled Ge quantum dot (QD) multilayers can create large-area photonic nanostructures, and the geometry can be tuned by changing wet etching conditions. It is found that the reflectance in the near-infrared wavelength can be decreased by controlling geometry, and an increase in the depth of the photonic nanostructures results in enhancement of photoluminescence intensity from Ge QDs. These results show that control of geometry in photonic nanostructures is useful for enhancement of optical absorption in the Ge QD multilayers.

Original languageEnglish
Pages (from-to)338-341
Number of pages4
JournalThin Solid Films
Volume557
DOIs
Publication statusPublished - 2014 Apr 30

Keywords

  • Ge
  • Nanostructure
  • Self-assembly
  • Si
  • Solar cell

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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