Contactless measurement of electrical conductivity of semiconductor wafers using the reflection of millimeter waves

Yang Ju, Kojiro Inoue, Masumi Saka, Hiroyuki Abé

Research output: Contribution to journalArticlepeer-review

25 Citations (Scopus)

Abstract

We present a method for quantitative measurement of electrical conductivity of semiconductor wafers in a contactless fashion by using millimeter waves. A focusing sensor was developed to focus a 110 GHz millimeter wave beam on the surface of a silicon wafer. The amplitude and the phase of the reflection coefficient of the millimeter wave signal were measured by which electrical conductivity of the wafer was determined quantitatively, independent of the permittivity and thickness of the wafers. The conductivity obtained by this method agrees well with that measured by the conventional four-point-probe method.

Original languageEnglish
Pages (from-to)3585-3587
Number of pages3
JournalApplied Physics Letters
Volume81
Issue number19
DOIs
Publication statusPublished - 2002 Nov 4

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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