Construction of the distribution system for ozonized water used in the wet cleaning of Si wafer surface

O. Nakamura, M. Yoshida, Y. Shirai, M. Nagase, M. Kitano, M. Gozyuki, Y. Hashimoto, T. Ohmi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationUltra Clean Processing of Silicon Surfaces
EditorsMarc Heyns, Marc Meuris, Paul Mertens
PublisherTrans Tech Publications Ltd
Pages161-164
Number of pages4
ISBN (Print)9783908450405
DOIs
Publication statusPublished - 1999
Event4th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 1998 - Ostend, Belgium
Duration: 1998 Sep 211998 Sep 23

Publication series

NameSolid State Phenomena
Volume65-66
ISSN (Print)1012-0394
ISSN (Electronic)1662-9779

Other

Other4th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 1998
Country/TerritoryBelgium
CityOstend
Period98/9/2198/9/23

Keywords

  • Aluminum oxide
  • Ozone gas
  • Ozonized water

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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