Conformal coating of poly(glycidyl methacrylate) as a lithographic polymer by initiated chemical vapor deposition

S. Yoshida, T. Kobayashi, M. Kumano, M. Esashi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This study reports on the investigation of the conformability and photo and electron beam (EB) patternability of a poly-glycidyl methacrylate (PGMA) film formed by initiated chemical vapor deposition (i-CVD). It is demonstrated that the PGMA film can be conformally deposited on a Si trench structure via i-CVD. In addition, the pattern definition of the film is also successfully demonstrated by deep ultraviolet and EB lithography. These achievements indicate that i-CVD has the potential to become a powerful method to achieve the conformal coating of a lithographic resist.

Original languageEnglish
Title of host publication2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
Pages994-997
Number of pages4
DOIs
Publication statusPublished - 2011
Event2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 - Beijing, China
Duration: 2011 Jun 52011 Jun 9

Publication series

Name2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

Other

Other2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
CountryChina
CityBeijing
Period11/6/511/6/9

Keywords

  • Conformal coating
  • Initiated chemical vapor deposition
  • Poly-glycidyl methacrylate
  • Resist coating technology

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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