Abstract
A cobalt ultrathin film, which shows a large change in Curie temperature by an electric field application, has been studied by X-ray reflectometry with applying electric fields. The cobalt film was made by the sputtering method on top of a Pt buffer layer, and capped with a MgO layer. X-ray reflectometry shows that the change in Co thickness caused by the applied voltage up to ±10 V was less than 0.06 Å. The reflectivity signal intensity shows a characteristic kink at the Co K-absorption edge. The spectrum does not show any change with applying voltage. As a result, electric field effects on the structure and chemical states of Co in the Co ultrathin film were found to be minor.
Original language | English |
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Pages (from-to) | 569-575 |
Number of pages | 7 |
Journal | Zeitschrift fur Physikalische Chemie |
Volume | 230 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2016 Apr 28 |
Externally published | Yes |
Keywords
- Thin Film
- X-ray Reflectivity
ASJC Scopus subject areas
- Physical and Theoretical Chemistry