Confirmation of no Structural and Chemical Changes in Curie Temperature Variable Co Ultrathin Films by Electric Field

Yusuke Wakabayashi; Hiromasa Fujii; Tsuyoshi Kimura; Osami Sakata; Hiroo Tajiri; Tomohiro Koyama; Daichi Chiba

doi:10.1515/zpch-2015-0648

Confirmation of no Structural and Chemical Changes in Curie Temperature Variable Co Ultrathin Films by Electric Field

Yusuke Wakabayashi, Hiromasa Fujii, Tsuyoshi Kimura, Osami Sakata, Hiroo Tajiri, Tomohiro Koyama, Daichi Chiba

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

A cobalt ultrathin film, which shows a large change in Curie temperature by an electric field application, has been studied by X-ray reflectometry with applying electric fields. The cobalt film was made by the sputtering method on top of a Pt buffer layer, and capped with a MgO layer. X-ray reflectometry shows that the change in Co thickness caused by the applied voltage up to ±10 V was less than 0.06 Å. The reflectivity signal intensity shows a characteristic kink at the Co K-absorption edge. The spectrum does not show any change with applying voltage. As a result, electric field effects on the structure and chemical states of Co in the Co ultrathin film were found to be minor.

Original language	English
Pages (from-to)	569-575
Number of pages	7
Journal	Zeitschrift fur Physikalische Chemie
Volume	230
Issue number	4
DOIs	https://doi.org/10.1515/zpch-2015-0648
Publication status	Published - 2016 Apr 28
Externally published	Yes

Keywords

Thin Film
X-ray Reflectivity

ASJC Scopus subject areas

Physical and Theoretical Chemistry

Access to Document

10.1515/zpch-2015-0648

Cite this

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title = "Confirmation of no Structural and Chemical Changes in Curie Temperature Variable Co Ultrathin Films by Electric Field",

abstract = "A cobalt ultrathin film, which shows a large change in Curie temperature by an electric field application, has been studied by X-ray reflectometry with applying electric fields. The cobalt film was made by the sputtering method on top of a Pt buffer layer, and capped with a MgO layer. X-ray reflectometry shows that the change in Co thickness caused by the applied voltage up to ±10 V was less than 0.06 {\AA}. The reflectivity signal intensity shows a characteristic kink at the Co K-absorption edge. The spectrum does not show any change with applying voltage. As a result, electric field effects on the structure and chemical states of Co in the Co ultrathin film were found to be minor.",

keywords = "Thin Film, X-ray Reflectivity",

author = "Yusuke Wakabayashi and Hiromasa Fujii and Tsuyoshi Kimura and Osami Sakata and Hiroo Tajiri and Tomohiro Koyama and Daichi Chiba",

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TY - JOUR

T1 - Confirmation of no Structural and Chemical Changes in Curie Temperature Variable Co Ultrathin Films by Electric Field

AU - Wakabayashi, Yusuke

AU - Fujii, Hiromasa

AU - Kimura, Tsuyoshi

AU - Sakata, Osami

AU - Tajiri, Hiroo

AU - Koyama, Tomohiro

AU - Chiba, Daichi

PY - 2016/4/28

Y1 - 2016/4/28

N2 - A cobalt ultrathin film, which shows a large change in Curie temperature by an electric field application, has been studied by X-ray reflectometry with applying electric fields. The cobalt film was made by the sputtering method on top of a Pt buffer layer, and capped with a MgO layer. X-ray reflectometry shows that the change in Co thickness caused by the applied voltage up to ±10 V was less than 0.06 Å. The reflectivity signal intensity shows a characteristic kink at the Co K-absorption edge. The spectrum does not show any change with applying voltage. As a result, electric field effects on the structure and chemical states of Co in the Co ultrathin film were found to be minor.

AB - A cobalt ultrathin film, which shows a large change in Curie temperature by an electric field application, has been studied by X-ray reflectometry with applying electric fields. The cobalt film was made by the sputtering method on top of a Pt buffer layer, and capped with a MgO layer. X-ray reflectometry shows that the change in Co thickness caused by the applied voltage up to ±10 V was less than 0.06 Å. The reflectivity signal intensity shows a characteristic kink at the Co K-absorption edge. The spectrum does not show any change with applying voltage. As a result, electric field effects on the structure and chemical states of Co in the Co ultrathin film were found to be minor.

KW - Thin Film

KW - X-ray Reflectivity

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Confirmation of no Structural and Chemical Changes in Curie Temperature Variable Co Ultrathin Films by Electric Field

Abstract

Keywords

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