Condition determination of ultraviolet light exposure for high-throughput nanoimprinting

Yota Ishito, Haruna Yano, Nobuya Hiroshiba, Shoichi Kubo, Masaru Nakagawa

    Research output: Contribution to journalArticlepeer-review

    1 Citation (Scopus)

    Abstract

    A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting.

    Original languageEnglish
    Pages (from-to)1373-1375
    Number of pages3
    JournalChemistry Letters
    Volume45
    Issue number12
    DOIs
    Publication statusPublished - 2016

    Keywords

    • Lithography
    • Nanoimprinting
    • UV

    ASJC Scopus subject areas

    • Chemistry(all)

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