Computational study of quenching effects on growth processes and size distributions of silicon nanoparticles at a thermal plasma tail

Masaya Shigeta, Yusuke Hirayama, Emanuele Ghedini

Research output: Contribution to journalArticlepeer-review

Abstract

In this paper, quenching effects on silicon nanoparticle growth processes and size distributions at a typical range of cooling rates in a thermal plasma tail are investigated computationally. We used a nodal-type model that expresses a size distribution evolving temporally with simultaneous homogeneous nucleation, heterogeneous condensation, interparticle coagulation, and melting point depression. The numerically obtained size distributions exhibit similar size ranges and tendencies to those of experiment results obtained with and without quenching. In a highly super-saturated state, 40–50% of the vapor atoms are converted rapidly to nanoparticles. After most vapor atoms are consumed, the nanoparticles grow by coagulation, which occurs much more slowly than condensation. At higher cooling rates, one obtains greater total number density, smaller size, and smaller standard deviation. Quenching in thermal plasma fabrication is effectual, but it presents limitations for controlling nanoparticle characteristics.

Original languageEnglish
Article number1370
JournalNanomaterials
Volume11
Issue number6
DOIs
Publication statusPublished - 2021 Jun

Keywords

  • Growth
  • Multiscale modeling and simulation
  • Nanoparticles
  • Plasma
  • Quenching

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Materials Science(all)

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