Computational prediction of cryogenic micro-nano solid nitrogen particle production using laval nozzle for physical photo resist removal-cleaning technology

Research output: Contribution to journalConference articlepeer-review

Abstract

The fundamental characteristics of the cryogenic single-component micro-nano solid nitrogen (SN2) particle production using super adiabatic Laval nozzle and its application to the physical photo resist removal-cleaning technology are investigated by a new type of integrated measurement coupled computational technique. As a result of present computation, it is found that high-speed ultra-fine SN2 particles are continuously generated due to the freezing of liquid nitrogen (LN2) droplets induced by rapid adiabatic expansion of transonic subcooled two-phase nitrogen flow passing through the Laval nozzle. Furthermore, the effect of SN2 particle diameter, injection velocity, and attack angle to the wafer substrate on resist removal-cleaning performance is investigated in detail by integrated measurement coupled computational technique.

Original languageEnglish
Pages (from-to)607-612
Number of pages6
JournalPhysics Procedia
Volume67
DOIs
Publication statusPublished - 2015
Event25th International Cryogenic Engineering Conference and International Cryogenic Materials Conference, ICEC/ICMC 2014 - Enschede, Netherlands
Duration: 2014 Jul 72014 Jul 11

Keywords

  • Atomization
  • Heat transfer
  • Multiphase flow
  • Solid nitrogen particle
  • Thermomechanical effect
  • Wafer cleaning

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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