TY - JOUR
T1 - Computational prediction of cryogenic micro-nano solid nitrogen particle production using laval nozzle for physical photo resist removal-cleaning technology
AU - Ishimoto, Jun
AU - Abe, Haruto
AU - Ochiai, Naoya
N1 - Funding Information:
This research was supported by a Support Program for Interdisciplinary Research from Frontier Research Institute for Interdisciplinary Sciences (FRIS), Tohoku University. This work was partly supported by the JSPS Core-to-Core Program, A. Advanced Research Networks, “International research core on smart layered materials and structures for energy saving,” and also supported by the Collaborative Research Project of the IFS, Tohoku University. Part of the numerical results in this research were obtained using supercomputing resources at Cyberscience Center, Tohoku University.
PY - 2015
Y1 - 2015
N2 - The fundamental characteristics of the cryogenic single-component micro-nano solid nitrogen (SN2) particle production using super adiabatic Laval nozzle and its application to the physical photo resist removal-cleaning technology are investigated by a new type of integrated measurement coupled computational technique. As a result of present computation, it is found that high-speed ultra-fine SN2 particles are continuously generated due to the freezing of liquid nitrogen (LN2) droplets induced by rapid adiabatic expansion of transonic subcooled two-phase nitrogen flow passing through the Laval nozzle. Furthermore, the effect of SN2 particle diameter, injection velocity, and attack angle to the wafer substrate on resist removal-cleaning performance is investigated in detail by integrated measurement coupled computational technique.
AB - The fundamental characteristics of the cryogenic single-component micro-nano solid nitrogen (SN2) particle production using super adiabatic Laval nozzle and its application to the physical photo resist removal-cleaning technology are investigated by a new type of integrated measurement coupled computational technique. As a result of present computation, it is found that high-speed ultra-fine SN2 particles are continuously generated due to the freezing of liquid nitrogen (LN2) droplets induced by rapid adiabatic expansion of transonic subcooled two-phase nitrogen flow passing through the Laval nozzle. Furthermore, the effect of SN2 particle diameter, injection velocity, and attack angle to the wafer substrate on resist removal-cleaning performance is investigated in detail by integrated measurement coupled computational technique.
KW - Atomization
KW - Heat transfer
KW - Multiphase flow
KW - Solid nitrogen particle
KW - Thermomechanical effect
KW - Wafer cleaning
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U2 - 10.1016/j.phpro.2015.06.103
DO - 10.1016/j.phpro.2015.06.103
M3 - Conference article
AN - SCOPUS:84948427813
VL - 67
SP - 607
EP - 612
JO - Physics Procedia
JF - Physics Procedia
SN - 1875-3892
T2 - 25th International Cryogenic Engineering Conference and International Cryogenic Materials Conference, ICEC/ICMC 2014
Y2 - 7 July 2014 through 11 July 2014
ER -