Comprehensive x-ray photoelectron spectroscopy study on compositional gradient lanthanum silicate film

K. Kakushima, K. Tachi, J. Song, S. Sato, H. Nohira, E. Ikenaga, P. Ahmet, K. Tsutsui, N. Sugii, T. Hattori, H. Iwai

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20 Citations (Scopus)

Abstract

Oxygen bonding in La-silicate film with compositional gradient has been characterized by x-ray photoelectron spectroscopy. Based on an analytical model of bridging and nonbridging oxygen, the O 1s spectra arising from La-silicate layer have been deconvoluted with compositionally dependent parameters. For a composition ratio of 1:1 for SiO2 and LaO1.5 on the surface of the La-silicate layer, negative binding energy shifts of 0.35 and 0.10 eV for bridging and nonbridging oxygen, respectively, have been found to well interpret the angle-resolved spectra. The method has also been applied to characterize the temperature dependence of interface reactions at La 2O3/Si with in situ processed Pt electrode. SiO 4 molecules combined with bridging and nonbridging oxygen atoms have been found to form by high temperature annealing. The thickness of the silicate layer of 0.4 nm at as-deposited state has been found grow up to 2.8 nm after 500 °C annealing. From rough estimation, it has been revealed that 10% of the newly created bridging oxygen atoms by annealing are incorporated into SiO 4 network which contain also nonbridging oxygen atoms.

Original languageEnglish
Article number124903
JournalJournal of Applied Physics
Volume106
Issue number12
DOIs
Publication statusPublished - 2009
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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