Composition spread metal thin film fabrication technique based on ion beam sputter deposition

P. Ahmet, T. Nagata, D. Kukuruznyak, S. Yagyu, Y. Wakayama, M. Yoshitake, T. Chikyow

Research output: Contribution to journalConference articlepeer-review

12 Citations (Scopus)

Abstract

A composition spread metal thin film fabrication technique based on ion beam sputter deposition method was developed. The technique enables us to fabricate any desired part or a complete binary/ternary composition spread metal thin films onto a single substrate by sequentially sputtering different target materials. Composition spread metal thin films can be deposited directly on a dielectric film in patterned electrode shape for C-V and I-V measurements. The system could be especially useful in the search for new multi-component metal gate materials.

Original languageEnglish
Pages (from-to)2472-2476
Number of pages5
JournalApplied Surface Science
Volume252
Issue number7
DOIs
Publication statusPublished - 2006 Jan 21
Externally publishedYes
EventProceedings of the Third Japan-US Workshop on Combinatorial Material Science and Technology CMST-e SI -
Duration: 2004 Dec 72004 Dec 10

Keywords

  • Composition spread
  • Ion beam
  • Metal gate
  • Metal thin film

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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