Comparative study of tri-gate- and double-gate-type poly-Si fin-channel split-gate flash memories

Y. X. Liu, T. Kamei, T. Matsukawa, Kazuhiko Endo, S. O'uchi, J. Tsukada, H. Yamauchi, Y. Ishikawa, T. Hayashida, K. Sakamoto, A. Ogura, M. Masahara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science