Combinatorial analyses of plasma-polymer interactions

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

Plasma-process analyses were demonstrated on the basis of combinatorial method, in which process examinations with continuous variations of plasma-process conditions can be carried out on a substrate holder with a graded distribution of process parameters. Controllability of density gradation in the combinatorial plasma process analyzer together with combinatorial analyses of etching characteristics and surface chemical bonding states of polyethylene terephthalate (PET) films exposed to argon-oxygen mixture plasmas. The etching properties and chemical bonding states (phenyl group) have been investigated for the PET films exposed to argon-oxygen mixture plasmas. The etching-depth data obtained from three independent batches of the experiments showed universal and almost linear dependence with increasing product of (ion saturation current) × (exposure time), which is in proportion to ion dose. The chemical bonding state analyses of phenyl group showed insignificant degradation with increasing ion dose.

Original languageEnglish
Pages (from-to)S484-S489
JournalSurface and Coatings Technology
Volume205
Issue numberSUPPL. 2
DOIs
Publication statusPublished - 2011 Jul 25

Keywords

  • Combinatorial method
  • Density-gradation plasma
  • Plasma nano science
  • Plasma-polymer interaction
  • Plasma-process analysis

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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