Combination of high-resolution RBS and angle-resolved XPS: Accurate depth profiling of chemical states

Kenji Kimura, Kaoru Nakajima, Ming Zhao, Hiroshi Nohira, Takeo Hattori, Masaaki Kobata, Eiji Ikenaga, Jung Jin Kim, Keisuke Kobayashi, Thierry Conard, Wilfried Vandervorst

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

A new method for the combination analysis of high-resolution Rutherford backscattering spectroscopy (HRBS) and angleresolved X-ray photoelectron spectroscopy (AR-XPS) is proposed for accurate depth profiling of chemical states. In this method, attenuation lengths (ALs) for the photoelectrons are first determined so that the AR-XPS result is consistent with the HRBS result. Depth profiling of the chemical states are then performed in the AR-XPS analysis using the composition-depth profiles obtained by HRBS as constrained conditions. This method is successfully applied to Hf-based gate stack structures demonstrating its feasibility.

Original languageEnglish
Pages (from-to)423-426
Number of pages4
JournalSurface and Interface Analysis
Volume40
Issue number3-4
DOIs
Publication statusPublished - 2008 Mar 1

Keywords

  • Angle-resolved XPS
  • Combination analysis
  • Depth profiling
  • High-resolution RBS

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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    Kimura, K., Nakajima, K., Zhao, M., Nohira, H., Hattori, T., Kobata, M., Ikenaga, E., Kim, J. J., Kobayashi, K., Conard, T., & Vandervorst, W. (2008). Combination of high-resolution RBS and angle-resolved XPS: Accurate depth profiling of chemical states. Surface and Interface Analysis, 40(3-4), 423-426. https://doi.org/10.1002/sia.2628