Comb-drive III-nitride micro mirror fabricated by fast atom beam etching

Y. J. Wang, Takashi Sasaki, T. Wu, F. R. Hu, Kazuhiro Hane

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report here the fabrication of comb drive III-nitride micro mirror on an III-nitride/silicon platform. Silicon substrate is first patterned from the backside and removed by deep reactive ion etching (DRIE). III-nitride microstructures are defined on freestanding III-nitride slab by backside alignment technique and generated by fast atom beam (FAB) etching. The fabricated comb-drive III-nitride micro mirrors can operate on high resistivity silicon substrate without introducing additional isolation layer. The optical rotation angles are experimentally characterized in the rotation experiments. This work opens the possibility for producing III-nitride optical micro-electro-mechanical-system (MEMS) devices on an III-nitride/silicon platform.

Original languageEnglish
Title of host publication2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
Pages1324-1327
Number of pages4
DOIs
Publication statusPublished - 2011 Sep 1
Event2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 - Beijing, China
Duration: 2011 Jun 52011 Jun 9

Publication series

Name2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

Other

Other2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
CountryChina
CityBeijing
Period11/6/511/6/9

Keywords

  • Fast atom beam etching
  • III-nitride
  • MEMS mirror

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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