Co cluster coalescence behavior observed by electrical conduction and transmission electron microscopy

D. L. Peng, T. J. Konno, K. Wakoh, T. Hihara, K. Sumiyama

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)

Abstract

We deposited monodispersed Co clusters with mean diameters d = 6, 8.5, and 13 nm on quartz and microgrid substrates using a plasma-gas-condensation-type cluster beam deposition system. The cluster-cluster coalescence behavior of the Co cluster assemblies was investigated by in situ electrical conductivity measurements and ex situ transmission electron microscopy (TEM). The electrical conductivity measurement indicates that, below temperature T ≈ 100 °C, the Co clusters with d = 8.5 nm maintain their original size as deposited at room temperature, while the cluster-cluster coalescence takes place at their interface at T > 100 °C. The TEM observation indicates that the morphology of the cluster distribution shows no marked change at substrate temperatures Ts < 250 °C. Above Ts = 300 °C, the interfacial area of coalesced clusters is crystalline, and has its own orientation, different from that of two connected cluster cores.

Original languageEnglish
Pages (from-to)1535-1537
Number of pages3
JournalApplied Physics Letters
Volume78
Issue number11
DOIs
Publication statusPublished - 2001 Mar 12

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint

Dive into the research topics of 'Co cluster coalescence behavior observed by electrical conduction and transmission electron microscopy'. Together they form a unique fingerprint.

Cite this