CMOS integration of dual work function phase controlled Ni FUSI with simultaneous silicidation of NMOS (NiSi) and PMOS (Ni-rich silicide) gates on HfSiON

A. Lauwers, A. Veloso, T. Hoffmann, M. J.H. Van Dal, C. Vrancken, S. Brus, S. Locorotondo, J. F. De Marneffe, B. Sijmus, S. Kubicek, T. Chiarella, M. A. Pawlak, K. Opsomer, M. Niwa, R. Mitsuhashi, K. G. Anil, H. Y. Yu, C. Demeurisse, R. Verbeeck, M. De PotterP. Absil, K. Maex, M. Jurczak, S. Biesemans, J. A. Kittl

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Citations (Scopus)

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