CMOS integration of dual work function phase controlled Ni FUSI with simultaneous silicidation of NMOS (NiSi) and PMOS (Ni-rich silicide) gates on HfSiON

A. Lauwers, A. Veloso, T. Hoffmann, M. J.H. Van Dal, C. Vrancken, S. Brus, S. Locorotondo, J. F. De Marneffe, B. Sijmus, S. Kubicek, T. Chiarella, M. A. Pawlak, K. Opsomer, M. Niwa, R. Mitsuhashi, K. G. Anil, H. Y. Yu, C. Demeurisse, R. Verbeeck, M. De PotterP. Absil, K. Maex, M. Jurczak, S. Biesemans, J. A. Kittl

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Fingerprint

Dive into the research topics of 'CMOS integration of dual work function phase controlled Ni FUSI with simultaneous silicidation of NMOS (NiSi) and PMOS (Ni-rich silicide) gates on HfSiON'. Together they form a unique fingerprint.

Engineering

Chemistry

Chemical Engineering

Computer Science

Material Science