Cluster-preforming-deposited amorphous WSin (n = 12) insertion film of low SBH and high diffusion barrier for direct Cu contact

Naoya Okada, Noriyuki Uchida, Sinichi Ogawa, Kazuhiko Endo, Toshihiko Kanayama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy