Cleaning-free deposition of highly crystallized Si films on plastic film substrates using pulsed-plasma CVD under near-atmospheric pressure

M. Matsumoto, S. Ito, Y. Inayoshi, S. Murashige, H. Fukidome, M. Suemitsu, S. Nakajima, T. Uehara, Y. Toyoshima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

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Engineering & Materials Science