Chiral surface formation of copper films by magnetoelectrochemical etching

I. Mogi, R. Aogaki, K. Watanabe

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)


Formation of a chiral surface was investigated in magnetoelectrochemical etching (MEE). The MEE of copper films was conducted in galvanostatic conditions with various etching currents in a magnetic field of 5 T perpendicular to the electrode surfaces. The MEE film electrodes exhibited a current difference in voltammograms between alanine enantiomers, and such chiral behavior depended on the etching current and magnetic field polarity at the MEE processes.

Original languageEnglish
Pages (from-to)361-368
Number of pages8
Issue number2
Publication statusPublished - 2015 Jan 1

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Electrical and Electronic Engineering


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