Chemical Vapor Deposition of Monolayer Mo1-xWxS2 Crystals with Tunable Band Gaps

Ziqian Wang, Pan Liu, Yoshikazu Ito, Shoucong Ning, Yongwen Tan, Takeshi Fujita, Akihiko Hirata, Mingwei Chen

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Abstract

Band gap engineering of monolayer transition metal dichalcogenides, such as MoS2 and WS2, is essential for the applications of the two-dimensional (2D) crystals in electronic and optoelectronic devices. Although it is known that chemical mixture can evidently change the band gaps of alloyed Mo1-xWxS2 crystals, the successful growth of Mo1-xWxS2 monolayers with tunable Mo/W ratios has not been realized by conventional chemical vapor deposition. Herein, we developed a low-pressure chemical vapor deposition (LP-CVD) method to grow monolayer Mo1-xWxS2 (x = 0-1) 2D crystals with a wide range of Mo/W ratios. Raman spectroscopy and high-resolution transmission electron microscopy demonstrate the homogeneous mixture of Mo and W in the 2D alloys. Photoluminescence measurements show that the optical band gaps of the monolayer Mo1-xWxS2 crystals strongly depend on the Mo/W ratios and continuously tunable band gap can be achieved by controlling the W or Mo portion by the LP-CVD.

Original languageEnglish
Article number21536
JournalScientific reports
Volume6
DOIs
Publication statusPublished - 2016 Feb 22

ASJC Scopus subject areas

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    Wang, Z., Liu, P., Ito, Y., Ning, S., Tan, Y., Fujita, T., Hirata, A., & Chen, M. (2016). Chemical Vapor Deposition of Monolayer Mo1-xWxS2 Crystals with Tunable Band Gaps. Scientific reports, 6, [21536]. https://doi.org/10.1038/srep21536