Chemical structures of native oxides formed during wet chemical treatments

Takeo Hattori, Kazuhiko Takase, Hiroaki Yamagishi, Rinshi Sugino, Yasuo Nara, Takashi Ito

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    56 Citations (Scopus)


    The chemical structures of the native oxides formed during various wet chemical treatments were measured nondestructively by changing the effective electron escape depth. The structures of the native oxides can be characterized by the distribution of suboxide Si3+ in the native oxide films. If Si3+ is correlated with Si-H bonds, the formation rate of the native oxide during the wet chemical treatment and the interface roughness produced by photoexcited dry etching through the oxide can be explained.

    Original languageEnglish
    Pages (from-to)296-298
    Number of pages3
    JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Issue number2
    Publication statusPublished - 1989 Feb

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)


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