Chemical mechanical properties of perovskite oxide abrasive grain: First-principles approach

Nobuki Ozawa, Yuji Higuchi, Momoji Kubo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

To elucidate the chemical mechanical polishing (CMP) performance of perovskite oxide abrasive grain for glass, we investigated electronic states of CaZrO3 and SrFeO3 by the first-principles calculation. The calculation results show that the Zr and Fe atoms in CaZrO3 and SrFeO3 take low valence states. We suggest that the metal atoms in perovskite oxide are effective for the glass polishing since low-valent metal atoms can weaken the Si-O bond of the glass surface by electron donation based on our reported CMP mechanism of glass by CeO2 abrasive grains.

Original languageEnglish
Title of host publicationICPT 2014 - Proceedings of International Conference on Planarization/CMP Technology 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages203-204
Number of pages2
ISBN (Electronic)9781479955565
DOIs
Publication statusPublished - 2015 Jan 20
Event11th International Conference on Planarization/CMP Technology, ICPT 2014 - Kobe, Japan
Duration: 2014 Nov 192014 Nov 21

Publication series

NameICPT 2014 - Proceedings of International Conference on Planarization/CMP Technology 2014

Other

Other11th International Conference on Planarization/CMP Technology, ICPT 2014
CountryJapan
CityKobe
Period14/11/1914/11/21

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Hardware and Architecture

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