Chemical controllability of charge states of nitrogen-related defects in HfOx Ny: First-principles calculations

N. Umezawa, K. Shiraishi, Y. Akasaka, A. Oshiyama, S. Inumiya, S. Miyazaki, K. Ohmori, Toyohiro Chikyo, T. Ohno, K. Yamabe, Y. Nara, K. Yamada

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Chemical Compounds