Chemical analysis of Hf-silicide clusters studied by photoemission spectroscopy

S. Toyoda, J. Okabayashi, H. Kumigashira, M. Oshima, K. Ono, M. Niwa, K. Usuda, G. L. Liu

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

High-resolution core-level photoemission spectroscopy has been performed on the nanoscaled Hf-silicide clusters, which were formed by the annealing at 1000°C in ultra-high vacuum of HfO2 films on Si(0 0 1) substrate utilized as ultra-large-scaled-integrated (ULSI) transistors. Angular dependence in Si 2p and Hf 4f core-level spectra revealed the chemical states in the metallic clusters. We compared two HfO2 samples with and without Hf-metal predeposition on Si substrate before the HfO2 deposition, which results in the different cluster size due to the different Hf concentration.

Original languageEnglish
Pages (from-to)487-490
Number of pages4
JournalJournal of Electron Spectroscopy and Related Phenomena
Volume144-147
DOIs
Publication statusPublished - 2005 Jun
Externally publishedYes

Keywords

  • Hf-silicide
  • Nanoclusters
  • Photoemission spectroscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Radiation
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Spectroscopy
  • Physical and Theoretical Chemistry

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