Charge trapping characteristics of W-La2O3-nSi MIS capacitors after post-metallization annealing in N2

Joel Molina, Kiichi Tachi, Kuniyuki Kakushima, Parhat Ahmet, Kazuo Tsutsui, Nobuyuki Sugii, Takco Hattori, Hiroshi Iwai

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    2 Citations (Scopus)

    Abstract

    In this paper, we report the effects of a N2-based Post-Metallization Annealing (PMA) thermal process on the reliability and charge trapping characteristics of tungsten-gated La2O3 thin films. The samples are stressed with a Constant Voltage Stress (CVS) under substrate injection so that electrons from the substrate are injected and trapped into localized states within the dielectric. Post-stress measurements of the flat band voltage Vfb of the samples have shown a positive shift indicating a net negative charge trapping effect within La2O3 and its interfaces. PMA samples have shown less Vfb shift after stress as compared to La2O3 films annealed before the gate metallization step. Moreover, relatively higher PMA temperatures will produce the higher endurance to Vfb shift while the Equivalent Oxide Thickness (EOT) of the MIS capacitors is compromised thus the necessity of a trade-off between less Vfb shift and low EOT is required. copyright The Electrochemical Society.

    Original languageEnglish
    Title of host publicationECS Transactions
    Pages233-244
    Number of pages12
    Volume3
    Edition3
    DOIs
    Publication statusPublished - 2006
    EventPhysics and Technology of High-k Gate Dielectrics 4 - 210th Electrochemical Society Meeting - Cancun, Mexico
    Duration: 2006 Oct 292006 Nov 3

    Other

    OtherPhysics and Technology of High-k Gate Dielectrics 4 - 210th Electrochemical Society Meeting
    CountryMexico
    CityCancun
    Period06/10/2906/11/3

    ASJC Scopus subject areas

    • Engineering(all)

    Fingerprint Dive into the research topics of 'Charge trapping characteristics of W-La2O3-nSi MIS capacitors after post-metallization annealing in N2'. Together they form a unique fingerprint.

    Cite this